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Complex and Dusty Plasmas: From Laboratory to Space (Series in Plasma Physics)

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Book Details

  • Author: Vladimir E. Fortov

  • Publisher: CRC Press

  • Edition: 1

  • Binding: Paperback

  • Number of Pages: 440

  • Release Date: 27-09-2019

  • ISBN: 9780367384630

  • Package Dimensions: 9.2 x 6.0 x 1.0 inches

  • Languages: English

About The Book
Complex and Dusty Plasmas: From Laboratory to Space offers a comprehensive and up-to-date exploration of dusty and complex plasmas, which are crucial not only in space environments but also in various technological applications. The book examines plasmas that contain solid or liquid charged particles, commonly referred to as dust. These complex plasmas naturally occur in space, such as in planetary rings and comet tails, and are also present near artificial satellites and space stations.

Beyond their role in space, dusty plasmas are actively studied for their importance in technological plasma applications, particularly in microelectronics, where they play a critical role in etching technologies, production of thin films, and nanoparticles.

The book provides a balanced and consistent picture of the current state of research, blending experimental and theoretical perspectives. It covers major types of complex plasmas encountered in ground-based and microgravity experiments, the unique properties of magnetized, thermal, cryogenic, and nuclear-induced plasmas, and the interactions between plasma and nonspherical particles. Furthermore, it delves into advanced topics such as phase transitions in complex plasma states, astrophysical aspects, and the contamination risks posed by dust in various applications.

A key feature of this work is its in-depth discussion of experimental and theoretical aspects of complex plasmas under microgravity conditions, as studied on the Mir and International Space Station (ISS). This book is an invaluable resource for researchers and practitioners in the field of plasma physics, as well as those working on applications in space science and technology.